Invention Grant
- Patent Title: Semiconductor device
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Application No.: US17153939Application Date: 2021-01-21
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Publication No.: US11201172B2Publication Date: 2021-12-14
- Inventor: Jae-Woo Seo , Ki-Man Park , Ha-Young Kim , Junghwan Shin , Keunho Lee , Sungwe Cho
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Muir Patent Law, PLLC
- Priority: KR10-2018-0143562 20181120,KR10-2019-0038256 20190402
- Main IPC: H03K3/356
- IPC: H03K3/356 ; H01L27/118 ; H01L27/02 ; H03K3/3562

Abstract:
Disclosed is a semiconductor device including a substrate with first and second regions adjacent to each other in a first direction, and first to third gate electrodes extending from the first region toward the second region. Each of the first and second regions includes a PMOSFET region and an NMOSFET region. The first to third gate electrodes extend in the first direction and are sequentially arranged in a second direction different from the first direction. The first and third gate electrodes are supplied with a first signal. The second gate electrode is supplied with a second signal that is an inverted signal of the first signal. The first gate electrode includes a first gate of the first region and a first gate of the second region. The first gates are aligned and connected with each other in the first direction.
Public/Granted literature
- US20210143181A1 SEMICONDUCTOR DEVICE Public/Granted day:2021-05-13
Information query
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