Invention Grant
- Patent Title: Semiconductor light-emitting device and method of manufacturing the same
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Application No.: US16471083Application Date: 2017-12-15
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Publication No.: US11205739B2Publication Date: 2021-12-21
- Inventor: Jumpei Yamamoto , Tetsuya Ikuta
- Applicant: DOWA Electronics Materials Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: DOWA Electronics Materials Co., Ltd.
- Current Assignee: DOWA Electronics Materials Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Kenja IP Law PC
- Priority: JPJP2016-246130 20161220
- International Application: PCT/JP2017/045194 WO 20171215
- International Announcement: WO2018/116995 WO 20180628
- Main IPC: H01L33/22
- IPC: H01L33/22 ; H01L33/00 ; H01L33/10 ; H01L33/30 ; H01L33/40

Abstract:
Provided is a semiconductor light-emitting device which can mitigate a multipeak in an emission spectrum in a bonding-type semiconductor light-emitting device having an InP cladding layer. The semiconductor light-emitting device of the present disclosure includes a first conductive type InP cladding layer, a semiconductor light-emitting layer, and a second conductive type InP cladding layer provided sequentially over a conductive support substrate, the second conductive type InP cladding layer being on a light extraction side, and the semiconductor light-emitting device further includes a metal reflective layer, between the conductive support substrate and the first conductive type InP cladding layer, for reflecting light emitted from the semiconductor light-emitting layer; and a plurality of recesses provided in a surface of the second conductive type InP cladding layer.
Public/Granted literature
- US20200020828A1 SEMICONDUCTOR LIGHT-EMITTING DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2020-01-16
Information query
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