Invention Grant
- Patent Title: Substrate support and substrate processing apparatus
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Application No.: US16117328Application Date: 2018-08-30
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Publication No.: US11211280B2Publication Date: 2021-12-28
- Inventor: Takayuki Sato , Naoya Matsuura
- Applicant: Kokusai Electric Corporation
- Applicant Address: JP Tokyo
- Assignee: Kokusai Electric Corporation
- Current Assignee: Kokusai Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Edell, Shapiro & Finnan, LLC
- Main IPC: H01L21/687
- IPC: H01L21/687 ; H01L21/67 ; H01J37/32

Abstract:
Described herein is a technique capable of preventing a susceptor made of quartz from being damaged by contacting a reflector deformed by thermal expansion. A substrate support according to the technique may include an upper susceptor made of quartz; a lower susceptor made of quartz; and a reflector reflecting heat and made of a metal in a planar shape. A lower surface of the upper susceptor is bonded with an upper surface of the lower susceptor such that the reflector is interposed therebetween, a first recess accommodating the reflector is provided at the upper surface of the lower susceptor, and a portion of the lower surface of the upper susceptor facing the first recess is roughened.
Public/Granted literature
- US20180374740A1 Substrate Support and Substrate Processing Apparatus Public/Granted day:2018-12-27
Information query
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