Invention Grant
- Patent Title: Method for producing synthetic quartz glass
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Application No.: US15959796Application Date: 2018-04-23
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Publication No.: US11214505B2Publication Date: 2022-01-04
- Inventor: Manabu Utsumi
- Applicant: Shin-Etsu Quartz Products Co., Ltd. , Heraeus Quarzglas GmbH & Co. KG
- Applicant Address: JP Tokyo; DE Hanau
- Assignee: Shin-Etsu Quartz Products Co., Ltd.,Heraeus Quarzglas GmbH & Co. KG
- Current Assignee: Shin-Etsu Quartz Products Co., Ltd.,Heraeus Quarzglas GmbH & Co. KG
- Current Assignee Address: JP Tokyo; DE Hanau
- Agency: Dicke, Billig & Czaja, PLLC
- Priority: JPJP2017-085708 20170424
- Main IPC: C03B25/02
- IPC: C03B25/02 ; C03C3/06 ; C03C23/00 ; C03B25/00

Abstract:
One aspect is a process to producing a synthetic quartz glass, including an annealing treatment that includes: putting a synthetic quartz glass as a parent material into a heat treatment furnace; elevating a temperature in the heat treatment furnace to a prescribed keeping temperature that is equal to or higher than the annealing point; keeping the keeping temperature; annealing the synthetic quartz glass; and taking the synthetic quartz glass out of the heat treatment furnace. The process includes determining an annealing rate v [° C./h] of the annealing step based on a value of S/V [mm2/mm3], wherein S [mm2] is the surface area of the synthetic quartz glass as a parent material and V [mm3] is the volume thereof and a target birefringence Re [nm/cm] for the synthetic quartz glass after the annealing, and the annealing step is performed at the determined annealing rate v.
Public/Granted literature
- US20180305236A1 METHOD FOR PRODUCING SYNTHETIC QUARTZ GLASS Public/Granted day:2018-10-25
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