Invention Grant
- Patent Title: Compound, resin, resist composition and method for producing resist pattern
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Application No.: US16482732Application Date: 2018-01-26
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Publication No.: US11214635B2Publication Date: 2022-01-04
- Inventor: Tatsuro Masuyama , Satoshi Yamaguchi , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Buchanan Ingersoll & Rooney PC
- Priority: JPJP2017-020998 20170208
- International Application: PCT/JP2018/002426 WO 20180126
- International Announcement: WO2018/147094 WO 20180816
- Main IPC: C08F20/28
- IPC: C08F20/28 ; C08F20/18 ; C08F20/30 ; G03F7/004 ; G03F7/038 ; G03F7/039 ; G03F7/16 ; G03F7/20

Abstract:
Disclosed is a compound represented by formula (I): in formula (I), R1 and R2 each independently represent a hydrogen atom or a methyl group, X1 and X2 each independently represent a group represented by any one of formula (X1−1) to formula (X1−8): A1 and A2 each independently represent an aliphatic hydrocarbon group having 1 to 24 carbon atoms which may have a substituent, and —CH2— included in the aliphatic hydrocarbon group may be replaced by —O—, —S—, —CO— or —S(O)2—, and R3 represents a hydrocarbon group having 1 to 24 carbon atoms which may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —S—, —CO— or —S(O)2—.
Public/Granted literature
- US20200231720A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Public/Granted day:2020-07-23
Information query
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