- Patent Title: Composition for high refractive index low dispersion resins for composite diffractive optical elements, and composite diffractive optical element using the same
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Application No.: US16091314Application Date: 2017-04-06
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Publication No.: US11214650B2Publication Date: 2022-01-04
- Inventor: Kousuke Namiki , Eiji Koshiishi , Kikuo Furukawa , Hiroshi Horikoshi
- Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
- Applicant Address: JP Tokyo
- Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
- Current Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
- Current Assignee Address: JP Tokyo
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JPJP2016-079016 20160411
- International Application: PCT/JP2017/014302 WO 20170406
- International Announcement: WO2017/179476 WO 20171019
- Main IPC: C08G75/045
- IPC: C08G75/045 ; G02B5/18 ; G02B1/04

Abstract:
A composition for a high refractive index, low dispersion resin for a close-contact double layer-type composite diffractive optical element that is highly photocurable and provides a high productivity, and a close-contact double layer-type composite diffractive optical element using such composition are provided. A composition for a high refractive index, low dispersion resin for a close-contact double layer-type composite diffractive optical element includes a thiol compound represented by general formula (1) or an oligomer synthesized by use of a thiol compound represented by general formula (1) (A component); and an ene compound including two or more polymerizable unsaturated bonds (B component). (In the formula, p represents an integer of 2 to 5; Xp and Zp independently represent a hydrogen atom or a mercaptomethyl group; a ratio of sulfur atoms in a molecule is 40 to 80% by mass; and the number of thiol groups is 3 or larger.).
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