Invention Grant
- Patent Title: Vapor phase deposition system
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Application No.: US16520488Application Date: 2019-07-24
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Publication No.: US11214867B2Publication Date: 2022-01-04
- Inventor: Giacomo Benvenuti , Estelle Halary Wagner , Christian Petit
- Applicant: ABCD TECHNOLOGY SARL
- Applicant Address: CH Geneva
- Assignee: ABCD TECHNOLOGY SARL
- Current Assignee: ABCD TECHNOLOGY SARL
- Current Assignee Address: CH Geneva
- Agency: Nixon & Vanderhye P.C.
- Priority: WOPCT/IB2008/054129 20081008
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C14/24 ; C23C14/22 ; C23C16/48 ; C23C16/00 ; C23C16/30 ; C23C16/44

Abstract:
A showerhead for vacuum deposition of several species, the showerhead being divided into several quarters containing each at least one outlet for the species, each of the quarter defining the wall of an underlying compartment containing at least one species, wherein two adjacent compartments contains different species. A process for vacuum deposition of one or more species onto a substrate, including providing a substrate for thin film growth in a growth chamber, providing two or more species to be effused towards the substrate, effusing the two or more species towards the substrate with line of sight propagation and in high vacuum conditions, and obtaining a thin film with gradients of chemical elements composition, morphology or crystalline phase.
Public/Granted literature
- US20200010955A1 VAPOR PHASE DEPOSITION SYSTEM Public/Granted day:2020-01-09
Information query
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