Invention Grant
- Patent Title: Active matrix substrate and manufacturing method thereof
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Application No.: US16880317Application Date: 2020-05-21
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Publication No.: US11215891B2Publication Date: 2022-01-04
- Inventor: Hideki Kitagawa , Yoshihito Hara , Masaki Maeda , Yoshiharu Hirata , Tatsuya Kawasaki , Teruyuki Ueda , Hajime Imai , Tohru Daitoh
- Applicant: SHARP KABUSHIKI KAISHA
- Applicant Address: JP Sakai
- Assignee: SHARP KABUSHIKI KAISHA
- Current Assignee: SHARP KABUSHIKI KAISHA
- Current Assignee Address: JP Sakai
- Agency: ScienBiziP, P.C.
- Main IPC: G02F1/1362
- IPC: G02F1/1362 ; G02F1/1368 ; H01L27/12

Abstract:
An active matrix substrate includes: a substrate; lower bus lines and upper bus lines; a lower insulating layer positioned between the lower bus lines and the upper bus lines; an oxide semiconductor TFT that are disposed in each pixel region and have an oxide semiconductor layer disposed on the lower insulating layer; pixel electrodes disposed in each pixel region; and wiring connection units arranged in a non-display region. Each wiring connection unit includes: a lower conductive layer formed using the same conductive film as the lower bus lines; an insulating layer that extends on the lower conductive layer and includes the lower insulating layer. The lower bus lines and the lower conductive layer have a first laminated structure including a metal layer and a transparent conductive layer that covers an upper surface and a side surface of the metal layer.
Public/Granted literature
- US20200371401A1 ACTIVE MATRIX SUBSTRATE AND MANUFACTURING METHOD THEREOF Public/Granted day:2020-11-26
Information query
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