Invention Grant
- Patent Title: Substrate placing table and substrate processing apparatus
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Application No.: US16721086Application Date: 2019-12-19
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Publication No.: US11217470B2Publication Date: 2022-01-04
- Inventor: Satoshi Taga , Naoyuki Satoh , Tatsuo Nishita
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- Priority: JPJP2018-244752 20181227,JPJP2019-203311 20191108
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01J37/32 ; C23C4/134

Abstract:
A substrate placing table according to an exemplary embodiment includes a base and an electrostatic chuck provided on the base. The electrostatic chuck includes a lamination layer portion, an intermediate layer, and a covering layer. The lamination layer portion is provided on the base. The intermediate layer is provided on the lamination layer portion. The covering layer is provided on the intermediate layer. The lamination layer portion includes a first layer, an electrode layer, and a second layer. The first layer is provided on the base. The electrode layer is provided on the first layer. The second layer is provided on the electrode layer. The intermediate layer is provided between the second layer and the covering layer and is in close contact with the second layer and the covering layer. The second layer is a resin layer. The covering layer is ceramics.
Public/Granted literature
- US20200211885A1 SUBSTRATE PLACING TABLE AND SUBSTRATE PROCESSING APPARATUS Public/Granted day:2020-07-02
Information query
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