Invention Grant
- Patent Title: Method for depositing a CdTe layer on a substrate
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Application No.: US16070039Application Date: 2017-02-03
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Publication No.: US11217720B2Publication Date: 2022-01-04
- Inventor: Henry Morgner , Christoph Metzner , Daniel Hirsch , Olaf Zywitzki , Ludwig Decker , Torsten Werner , Bastian Siepchen , Bettina Späth , Krishnakumar Velappan , Christian Kraft , Christian Drost
- Applicant: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. , CTF SOLAR GmbH
- Applicant Address: DE Munich; DE Dresden
- Assignee: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.,CTF SOLAR GmbH
- Current Assignee: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.,CTF SOLAR GmbH
- Current Assignee Address: DE Munich; DE Dresden
- Agency: Crowell & Moring LLP
- Priority: DE102016101856.2 20160203
- International Application: PCT/EP2017/052323 WO 20170203
- International Announcement: WO2017/134191 WO 20170810
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L31/18 ; C23C14/02 ; C23C14/06 ; C23C14/56 ; C23C14/00 ; C23C16/30 ; H01L31/0445 ; H01L27/146 ; H01L31/0296

Abstract:
A method for depositing a CdTe layer on a substrate in a vacuum chamber by means of physical gas phase deposition is provided. The substrate is heated to a coating temperature before the deposition process and then guided past a vessel in which CdTe is converted into a vapour state, a gaseous component with an increased pressure (compared to the vacuum in the vacuum chamber) flowing through at least one inlet, against the substrate surface to be coated, such that the gaseous component is adsorbed on the substrate surface to be coated before the substrate is guided past the at least one vessel.
Public/Granted literature
- US20190027634A1 METHOD FOR DEPOSITING A CDTE LAYER ON A SUBSTRATE Public/Granted day:2019-01-24
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