Invention Grant
- Patent Title: Bottom antireflective coating forming composition
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Application No.: US16324299Application Date: 2017-08-02
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Publication No.: US11221558B2Publication Date: 2022-01-11
- Inventor: Hiroshi Hitokawa , Tetsumasa Takaichi , Shunji Kawato , Tomohide Katayama
- Applicant: AZ Electronic Materials (Luxembourg) S.a.r.l.
- Applicant Address: LU Luxembourg
- Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
- Current Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
- Current Assignee Address: LU Luxembourg
- Agency: Faegre Drinker Biddle & Reath LLP
- Priority: JPJP2016-156900 20160809
- International Application: PCT/EP2017/069501 WO 20170802
- International Announcement: WO2018/029053 WO 20180215
- Main IPC: G03F7/09
- IPC: G03F7/09 ; C09D125/18 ; C09D133/14 ; G03F7/16 ; G03F7/20 ; G03F7/30

Abstract:
[Problem to be Solved] To provide a bottom antireflective coating forming composition which can show high etching resistance and can be crosslinked even at a relatively low temperature. Further, to provide a resist pattern manufacturing method and a device manufacturing method using the same. [Solution] The bottom antireflective coating forming composition comprises: a polymer A comprising specific repeating units; a low molecular crosslinking agent having a molecular weight of 100 to 3,000; and a solvent. The resist pattern manufacturing method and the device manufacturing method using the same are also provided.
Public/Granted literature
- US20190171107A1 BOTTOM ANTIREFLECTIVE COATING FORMING COMPOSITION Public/Granted day:2019-06-06
Information query
IPC分类: