Invention Grant
- Patent Title: Method and apparatus for measuring measurement of two-dimensional pattern corresponding to three-dimensional virtual clothing
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Application No.: US17027426Application Date: 2020-09-21
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Publication No.: US11222448B2Publication Date: 2022-01-11
- Inventor: Hohyun Lee , Yeji Kim
- Applicant: CLO Virtual Fashion Inc.
- Applicant Address: KR Seoul
- Assignee: CLO Virtual Fashion Inc.
- Current Assignee: CLO Virtual Fashion Inc.
- Current Assignee Address: KR Seoul
- Agency: Fenwick & West LLP
- Priority: KR10-2019-0101363 20190819,KR10-2020-0104206 20200819
- Main IPC: G06T11/20
- IPC: G06T11/20 ; G06T15/00 ; G06T15/10
Abstract:
A method and apparatus for measuring a measurement of a two-dimensional (2D) pattern receives a plurality of points in a space in which a 2D pattern of clothing is displayed, determines an attribute of an area in which the points are included, measures a length of a line segment using the points based on the determined attribute of the area, and outputs the length of the line segment.
Public/Granted literature
Information query
