- Patent Title: Methane gas production facility and methane gas production method
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Application No.: US16954436Application Date: 2017-12-20
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Publication No.: US11225858B2Publication Date: 2022-01-18
- Inventor: Komei Okatsu
- Applicant: JGC Corporation
- Applicant Address: JP Yokohama
- Assignee: JGC Corporation
- Current Assignee: JGC Corporation
- Current Assignee Address: JP Yokohama
- Agency: Jordan and Koda, PLLC
- International Application: PCT/JP2017/045730 WO 20171220
- International Announcement: WO2019/123571 WO 20190627
- Main IPC: E21B43/20
- IPC: E21B43/20 ; B01D19/00 ; E21B43/01

Abstract:
A methane gas production facility or the like capable of efficiently producing a methane gas from a wide range of a methane hydrate layer. In a methane gas production facility that produces a methane gas from a methane hydrate layer MHL, a first horizontal well is provided along the methane hydrate layer MHL and injection water supply units supply injection water obtained by dispersing a carbon dioxide gas in water to the first horizontal well. A second horizontal well is provided along an area in which methane released from methane hydrate by replacement with carbon dioxide rises, a decompression and suction unit decompresses the inside of the second horizontal well by pumping water and sucks water containing methane, and a gas-liquid separation unit separates a methane gas from the sucked water.
Public/Granted literature
- US20210087913A1 METHANE GAS PRODUCTION FACILITY AND METHANE GAS PRODUCTION METHOD Public/Granted day:2021-03-25
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