Invention Grant
- Patent Title: Method of manufacturing electrostatic chuck and electrostsatic chuck
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Application No.: US16028699Application Date: 2018-07-06
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Publication No.: US11227786B2Publication Date: 2022-01-18
- Inventor: Satoshi Taga , Yoshiyuki Kobayashi , Kazuya Nagaseki
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Weihrouch IP
- Priority: JPJP2017-133410 20170707
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01J37/32 ; C23C4/11 ; C23C4/134

Abstract:
Disclosed is a method of manufacturing an electrostatic chuck configured to attract a substrate by applying a voltage to a first electrode layer. The method includes forming the first electrode layer on a first resin layer on a base and thermally spraying ceramics or a ceramics-containing material on the first electrode layer. The thermally spraying the ceramic or the ceramics-containing material includes transporting powder of a thermal spray material, introduced into a nozzle from a feeder, by a plasma generation gas and spraying the powder from an opening in a tip end portion of the nozzle, dissociating the sprayed plasma generation gas by electric power of 500 W to 10 kW to generate plasma having a common axis with the nozzle, and forming the powder of the thermal spray material into a liquid phase by the generated plasma to form a film on the first electrode layer.
Public/Granted literature
- US20190013230A1 METHOD OF MANUFACTURING ELECTROSTATIC CHUCK AND ELECTROSTSATIC CHUCK Public/Granted day:2019-01-10
Information query
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