- Patent Title: Semiconductor device structure and manufacturing process thereof
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Application No.: US16595502Application Date: 2019-10-08
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Publication No.: US11227887B2Publication Date: 2022-01-18
- Inventor: Yi-Ping Pan , Hung-Jen Hsu
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Main IPC: H01L27/146
- IPC: H01L27/146

Abstract:
A semiconductor device structure for sensing an incident light includes a substrate, a passivation layer and a wiring structure. The substrate has a device embedded therein. The passivation layer is disposed on the substrate, where the passivation layer has a first side and a second side opposite to the first side, the first side of the passivation layer includes microstructures disposed on the substrate, and the second side of the passivation layer is a continuous flat plane, wherein each of the microstructures has a cross-section in a shape of a triangle, trapezoid or arc. The wiring structure is disposed on the substrate, where the writing structure includes at least one contact and metal interconnection patterns respectively formed in different dielectric layers, and the at least one contact and the metal interconnection patterns are electrically connected, where the substrate is located between the passivation layer and the wiring structure.
Public/Granted literature
- US20200052025A1 SEMICONDUCTOR DEVICE STRUCTURE AND MANUFACTURING PROCESS THEREOF Public/Granted day:2020-02-13
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