Invention Grant
- Patent Title: Imprint system and article manufacturing meihod
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Application No.: US16432173Application Date: 2019-06-05
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Publication No.: US11235495B2Publication Date: 2022-02-01
- Inventor: Kiyohito Yamamoto
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JPJP2016-239776 20161209
- Main IPC: B29C33/38
- IPC: B29C33/38 ; B29C59/02 ; H01L21/027

Abstract:
A replica manufacturing apparatus performs imprint processing of forming a pattern of an imprint material on a replica substrate using a master mold, processes the replica substrate with the formed pattern to manufacture a replica mold, and transfers data of a condition concerning the imprint processing to a management apparatus. An imprint apparatus acquires the data from the management apparatus, and performs the imprint processing of forming a pattern of an imprint material on a substrate using the replica mold.
Public/Granted literature
- US20190283281A1 IMPRINT SYSTEM AND ARTICLE MANUFACTURING METHOD Public/Granted day:2019-09-19
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