Invention Grant
- Patent Title: Electroplating method
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Application No.: US16495733Application Date: 2017-05-11
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Publication No.: US11236431B2Publication Date: 2022-02-01
- Inventor: Masayuki Iimori , Ryosuke Takeda
- Applicant: YKK Corporation
- Applicant Address: JP Tokyo
- Assignee: YKK Corporation
- Current Assignee: YKK Corporation
- Current Assignee Address: JP Tokyo
- Agency: Kilpatrick Townsend & Stockton LLP
- Priority: WOPCT/JP2017/015365 20170414
- International Application: PCT/JP2017/017949 WO 20170511
- International Announcement: WO2018/189916 WO 20181018
- Main IPC: C25D5/10
- IPC: C25D5/10 ; C25D3/56 ; C25D7/02 ; C25D17/16 ; C25D3/58 ; C25D3/60 ; A44B19/26 ; C25D5/00

Abstract:
A method includes: agitating base members that has been immersed in an electrolytic solution inside of an electroplating tank so as to flow in a circumference direction along an inner wall of the electroplating tank; and electroplating the base members flowing along the circumference direction in the electrolytic solution inside of the electroplating tank. The flow of the base members along the circumference direction is caused by a flow of magnetic media along the circumference direction in the electrolytic solution inside of the electroplating tank or is caused by rotation of an agitation unit provided at a bottom side of the electroplating tank. At least one of the base members touches a bottom cathode, and a base member positioned upward relative to the base member touching the bottom cathode is electrically connected to the bottom cathode via at least the base member touching the bottom cathode.
Public/Granted literature
- US20200095700A1 Electroplating Method and Device Public/Granted day:2020-03-26
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