Invention Grant
- Patent Title: Apparatus and method for processing a substrate
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Application No.: US16845487Application Date: 2020-04-10
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Publication No.: US11236433B2Publication Date: 2022-02-01
- Inventor: Martin Ayres , John MacNeil , Trevor Thomas
- Applicant: SPTS Technologies Limited
- Applicant Address: GB Newport
- Assignee: SPTS Technologies Limited
- Current Assignee: SPTS Technologies Limited
- Current Assignee Address: GB Newport
- Agency: Hodgson Russ LLP
- Priority: GB1905138 20190411
- Main IPC: C25D7/12
- IPC: C25D7/12 ; C25D21/10 ; C25D17/00 ; C25D21/12

Abstract:
An apparatus for electrochemically processing a semiconductor substrate includes a processing chamber of the type that is sealable to a peripheral portion of a semiconductor substrate so as to define a covered processing volume. The semiconductor substrate is supported by a substrate support. A magnetic arrangement is disposed outside of the processing chamber and produces a magnetic field. The magnetic field is changed using a controller for controlling the magnetic arrangement. An agitator is disposed within the processing chamber. The agitator comprises a magnetically responsive element which is responsive to changes in the magnetic field of the magnetic arrangement so as to provide a reciprocating motion to the agitator.
Public/Granted literature
- US20200325588A1 Apparatus and Method for Processing a Substrate Public/Granted day:2020-10-15
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