Invention Grant
- Patent Title: Time lapse shooting apparatus and observation method
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Application No.: US16828100Application Date: 2020-03-24
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Publication No.: US11236755B2Publication Date: 2022-02-01
- Inventor: Hiroaki Kii
- Applicant: NIKON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Staas & Halsey, LLP
- Priority: JP2010-022170 20100203
- Main IPC: F01D25/00
- IPC: F01D25/00 ; F04D29/02 ; G01N21/64 ; G02B21/36 ; F04D29/053 ; F04D29/058 ; F04D29/059 ; F16C3/02 ; F16C35/04

Abstract:
A certain material irregularly expressed in an observation area is effectively observed. An observing apparatus includes a first observing unit performing a time lapse shooting of a predetermined observation area, a first discriminating unit discriminating whether or not a first material is expressed in the observation area based on an image obtained by the first observing unit, and a second observing unit starting a time lapse shooting relating to a part where the first material is expressed at a timing when the first material is expressed in the observation area, in which a shooting frequency of the time lapse shooting by the second observing unit is higher than a shooting frequency of the time lapse shooting by the first observing unit.
Public/Granted literature
- US20200224663A1 TIME LAPSE SHOOTING APPARATUS AND OBSERVATION METHOD Public/Granted day:2020-07-16
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