Invention Grant
- Patent Title: Configuring optical layers in imprint lithography processes
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Application No.: US16920042Application Date: 2020-07-02
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Publication No.: US11237479B2Publication Date: 2022-02-01
- Inventor: Vikramjit Singh , Michael N. Miller , Frank Y. Xu , Christopher Fleckenstein
- Applicant: Molecular Imprints, Inc.
- Applicant Address: US TX Austin
- Assignee: Molecular Imprints, Inc.
- Current Assignee: Molecular Imprints, Inc.
- Current Assignee Address: US TX Austin
- Agency: Fish & Richardson P.C.
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/16 ; G02B5/18 ; G02F1/1339
Abstract:
An imprint lithography method of configuring an optical layer includes depositing a set of droplets atop a side of a substrate in a manner such that the set of droplets do not contact a functional pattern formed on the substrate. The imprint lithography method further includes curing the set of droplets to form a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the set of droplets at a position spaced apart from the functional pattern.
Public/Granted literature
- US20200333705A1 CONFIGURING OPTICAL LAYERS IN IMPRINT LITHOGRAPHY PROCESSES Public/Granted day:2020-10-22
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