Invention Grant
- Patent Title: Imprint templates and methods for forming imprinted patterns using the same
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Application No.: US17027825Application Date: 2020-09-22
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Publication No.: US11237480B2Publication Date: 2022-02-01
- Inventor: Wooyung Jung
- Applicant: SK hynix Inc.
- Applicant Address: KR Gyeonggi-do
- Assignee: SK hynix Inc.
- Current Assignee: SK hynix Inc.
- Current Assignee Address: KR Gyeonggi-do
- Agency: IP & T Group LLP
- Priority: KR10-2017-0049404 20170417
- Main IPC: G03F7/00
- IPC: G03F7/00
Abstract:
Methods for forming imprinted patterns using an imprint template. The imprint template may include at least an imprint portion and a photomask portion. The imprint portion may include imprinting patterns. The imprinting patterns may be transferred into a first imprint shot region of a resist layer. The photomask portion may include light blocking patterns. The light blocking patterns may provide a light permeation area corresponding to a boundary region defining a second imprint shot region of the resist layer.
Public/Granted literature
- US20210003914A1 IMPRINT TEMPLATES AND METHODS FOR FORMING IMPRINTED PATTERNS USING THE SAME Public/Granted day:2021-01-07
Information query
