The present invention provides an imprint apparatus that forms a pattern of an imprint material on a substrate using a mold, the apparatus including a first detection unit configured to detect a surface structure in a wafer edge region of the substrate, a specifying unit configured to specify, from the surface structure detected by the first detection unit, an effective region in which the pattern of the imprint material is formed, and a first determining unit configured to determine, based on the effective region specified by the specifying unit, a shape of a peripheral shot region whose area is smaller than an area of a pattern region of the mold, and a second determining unit configured to determine based on the shape determined by the first determining unit, a supply position of the imprint material in the peripheral shot region.