Invention Grant
- Patent Title: Adjustment assembly and substrate exposure system comprising such an adjustment assembly
-
Application No.: US16457765Application Date: 2019-06-28
-
Publication No.: US11237489B2Publication Date: 2022-02-01
- Inventor: Jerry Johannes Martinus Peijster
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Priority: NL2018108 20161230
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03F7/20

Abstract:
The invention relates to a substrate exposure system comprising a frame, a substrate support module for carrying a substrate, an exposure apparatus for exposing said substrate, and adjustment assembly for adjusting the position of the exposure apparatus with respect to the substrate support module. The adjustment assembly comprises a hydraulic actuator, a hydraulic generator and a conduit, wherein the conduit interconnects said hydraulic actuator and said hydraulic generator for forming a hydraulic system. The exposure apparatus, the frame, the adjustment assembly and the substrate support module are arranged as parts of a series of mechanically linked components. A first part of said series of mechanically linked components comprises the exposure apparatus, and a second part comprises the substrate support module. Said hydraulic actuator is arranged between said first part and said second part. Preferably the hydraulic actuator comprises a first bellows and the hydraulic generator comprises a second bellows.
Public/Granted literature
- US20190324375A1 ADJUSTMENT ASSEMBLY AND SUBSTRATE EXPOSURE SYSTEM COMPRISING SUCH AN ADJUSTMENT ASSEMBLY Public/Granted day:2019-10-24
Information query