Invention Grant
- Patent Title: Charged particle beam apparatus
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Application No.: US17030992Application Date: 2020-09-24
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Publication No.: US11239046B2Publication Date: 2022-02-01
- Inventor: Ayana Muraki , Atsushi Uemoto , Tatsuya Asahata
- Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
- Current Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Holland & Hart LLP
- Priority: JPJP2019-173889 20190925
- Main IPC: H01J37/20
- IPC: H01J37/20 ; H01J37/26 ; H01J37/22 ; H01J37/304 ; H01J37/30

Abstract:
To stabilize automated MS, provided is a charged particle beam apparatus, which is configured to automatically fabricate a sample piece from a sample, the charged particle beam apparatus including: a charged particle beam irradiation optical system configured to radiate a charged particle beam; a sample stage configured to move the sample that is placed on the sample stage; a sample piece transportation unit configured to hold and convey the sample piece separated and extracted from the sample; a holder fixing base configured to hold a sample piece holder to which the sample piece is transported; and a computer configured to perform control of a position with respect to a target, based on: a result of second determination about the position, which is executed depending on a result of first determination about the position; and information including an image that is obtained by irradiation with the charged particle beam.
Public/Granted literature
- US20210090851A1 CHARGED PARTICLE BEAM APPARATUS Public/Granted day:2021-03-25
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