Invention Grant
- Patent Title: Etching of metal oxides using fluorine and metal halides
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Application No.: US16898595Application Date: 2020-06-11
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Publication No.: US11239091B2Publication Date: 2022-02-01
- Inventor: Keenan N. Woods , Zhenjiang Cui , Mark Saly
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L21/311
- IPC: H01L21/311
Abstract:
Embodiments of this disclosure provide methods for etching oxide materials. Some embodiments of this disclosure provide methods which selectively etch oxide materials over other materials. In some embodiments, the methods of this disclosure are performed by atomic layer etching (ALE). In some embodiments, the methods of this disclosure are performed within a processing chamber comprising a nickel chamber material.
Information query
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