Invention Grant
- Patent Title: Electrode structure for field effect transistor
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Application No.: US16381485Application Date: 2019-04-11
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Publication No.: US11239326B2Publication Date: 2022-02-01
- Inventor: Jeffrey R. LaRoche , Kelly P. Ip , Thomas E. Kazior , Kamal Tabatabaie Alavi
- Applicant: Raytheon Company
- Applicant Address: US MA Waltham
- Assignee: Raytheon Company
- Current Assignee: Raytheon Company
- Current Assignee Address: US MA Waltham
- Agency: Daly, Crowley, Mofford & Durkee, LLP
- Main IPC: H01L29/40
- IPC: H01L29/40 ; H01L21/285 ; H01L23/48 ; H01L23/485 ; H01L29/417 ; H01L29/45 ; H01L29/66 ; H01L29/778 ; H01L29/20 ; H01L23/535 ; H01L21/28 ; H01L29/423 ; H01L23/532 ; H01L29/51

Abstract:
A Field Effect Transistor (FET) structure having: a semiconductor; a first electrode structure; a second electrode structure; and a third electrode structure for controlling a flow of carriers in the semiconductor between the first electrode structure and the second electrode structure; a dielectric structure disposed over the semiconductor and extending horizontally between first electrode structure, the second electrode structure and the third electrode structure; and a fourth electrode passing into the dielectric structure and terminating a predetermined, finite distance above the semiconductor for controlling an electric field in the semiconductor under the fourth electrode structure.
Public/Granted literature
- US20190237554A1 ELECTRODE STRUCTURE FOR FIELD EFFECT TRANSISTOR Public/Granted day:2019-08-01
Information query
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