Invention Grant
- Patent Title: Bipolar junction transistor with gate over terminals
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Application No.: US16785124Application Date: 2020-02-07
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Publication No.: US11239330B2Publication Date: 2022-02-01
- Inventor: Ming-Shuan Li , Zi-Ang Su , Ying-Keung Leung
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Slater Matsil, LLP
- Main IPC: H01L29/417
- IPC: H01L29/417 ; H01L29/78 ; H01L29/66 ; H01L29/73 ; H01L29/423

Abstract:
Embodiments include a first set of fins having an emitter of a bipolar junction transistor (BJT) disposed over the first set of fins, a second set of fins having a base of the BJT disposed over the second set of fins, and a third set of fins having a collector of the BJT disposed over the third set of fins. A first gate structure is disposed over the first set of fins adjacent to the emitter. A second gate structure is disposed over the second set of fins adjacent to the base. A third gate structure is disposed over the third set of fins adjacent to the collector. The first gate structure, second gate structure, and third gate structure are physically and electrically separated.
Public/Granted literature
- US20210249516A1 BIPOLAR JUNCTION TRANSISTOR WITH GATE OVER TERMINALS Public/Granted day:2021-08-12
Information query
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