Invention Grant
- Patent Title: Photoelectric conversion device, substrate, and system with semiconductor regions
-
Application No.: US16520499Application Date: 2019-07-24
-
Publication No.: US11239380B2Publication Date: 2022-02-01
- Inventor: Yuuichirou Hatano , Takahiro Shirai
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Venable LLP
- Priority: JPJP2018-140709 20180726
- Main IPC: H01L31/0352
- IPC: H01L31/0352 ; H04N5/335 ; H01L27/146

Abstract:
Photoelectric conversion device includes semiconductor chip including first semiconductor region, second semiconductor region arranged on the first semiconductor region, and third semiconductor region arranged on the second semiconductor region. Chip end face of the semiconductor chip is formed by the first semiconductor region, the second semiconductor region and the third semiconductor region. The first semiconductor region is of first conductivity type and the second semiconductor region is of second conductivity type. The third semiconductor region includes photoelectric conversion region, readout circuit region, and peripheral region. The peripheral region includes isolation region and outer periphery region arranged between the chip end face and the isolation region. The isolation region is of the second conductivity type and the outer periphery region is of the first conductivity type.
Public/Granted literature
- US20200035845A1 PHOTOELECTRIC CONVERSION DEVICE, SUBSTRATE, AND SYSTEM Public/Granted day:2020-01-30
Information query
IPC分类: