Invention Grant
- Patent Title: Pressure control strategies to provide uniform treatment streams in the manufacture of microelectronic devices
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Application No.: US16360624Application Date: 2019-03-21
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Publication No.: US11241720B2Publication Date: 2022-02-08
- Inventor: Kevin Siefering , Edward Hanzlik
- Applicant: TEL FSI, Inc.
- Applicant Address: US MN Chaska
- Assignee: TEL FSI, Inc.
- Current Assignee: TEL FSI, Inc.
- Current Assignee Address: US MN Chaska
- Agency: Kagan Binder, PLLC
- Main IPC: B08B3/02
- IPC: B08B3/02 ; B08B3/10 ; H01L21/67 ; H01L21/02
Abstract:
The present invention provides techniques to more accurately control the process performance of treatments in which microelectronic substrates are treated by pressurized fluids that are sprayed onto the substrates in a vacuum process chamber. control strategies are used that adjust mass flow rate responsive to pressure readings in order to hold the pressure of a pressurized feed constant. In these embodiments, the mass flow rate will tend to vary in order to maintain pressure uniformity.
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