Invention Grant
- Patent Title: Method for generating exposure compensation table, method for photoresist exposure compensation, and exposure machine
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Application No.: US16313140Application Date: 2018-10-22
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Publication No.: US11243474B2Publication Date: 2022-02-08
- Inventor: Bei Zhou Huang
- Applicant: HKC Corporation Limited
- Applicant Address: CN Shenzhen
- Assignee: HKC Corporation Limited
- Current Assignee: HKC Corporation Limited
- Current Assignee Address: CN Shenzhen
- Priority: CN201811054907.0 20180911
- International Application: PCT/CN2018/111241 WO 20181022
- International Announcement: WO2020/051982 WO 20200319
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
This application provides a method for generating an exposure compensation table, a method for photoresist exposure compensation, and an exposure machine. The method for generating an exposure compensation table includes: recording preset exposure parameters and a critical dimension value of a photoresist pattern; and exposing and developing until all preset exposure parameters have been tested.
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