- Patent Title: Stage apparatus, lithographic apparatus, control unit and method
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Application No.: US17050149Application Date: 2019-03-27
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Publication No.: US11243476B2Publication Date: 2022-02-08
- Inventor: Ringo Petrus Cornelis Van Dorst , Gijs Kramer , Benjamin Cunnegonda Henricus Smeets , Mark Johannes Hermanus Frencken
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP18169639 20180426,EP19150671 20190108
- International Application: PCT/EP2019/057672 WO 20190327
- International Announcement: WO2019/206548 WO 20191031
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/67

Abstract:
The invention provides a stage apparatus comprising an object support, a plurality of support members, a gripper and a control unit. The object support comprises a surface for mounting an object on, the surface extending in a plane. The plurality of support members are for supporting the object, and are arranged to receive the object from a gripper and to arrange the object on the surface and/or vice versa. The support members are moveable in at least a first direction which is perpendicular to the plane. The control unit is arranged to receive shape information regarding an out-of-plane-shape of the object, and is arranged to control positions of the support members. The control unit is arranged to tilt the object while supported by the support members by controlling the positions so as to reduce a space consumption of the object in the first direction, based on the shape information.
Public/Granted literature
- US20210116820A1 Stage Apparatus, Lithographic Apparatus, Control Unit and Method Public/Granted day:2021-04-22
Information query
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