Invention Grant
- Patent Title: MRAM memory cell layout for minimizing bitcell area
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Application No.: US16893010Application Date: 2020-06-04
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Publication No.: US11244983B2Publication Date: 2022-02-08
- Inventor: Harry-Hak-Lay Chuang , Wen-Chun You , Hung Cho Wang , Yen-Yu Shih
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Seed IP Law Group LLP
- Main IPC: H01L27/22
- IPC: H01L27/22 ; H01L43/02 ; H01L43/12

Abstract:
The present disclosure provides a system and method for forming a reduced area MRAM memory cell including a substrate, a transistor overlying the substrate and a magnetic tunnel junction overlying the transistor. The transistor includes a first and second source regions, a drain region between the first and second source regions, at least one first channel region between the drain region and the first source region, at least one second channel region between the drain region and the second source region, a first gate structure overlying the at least one first channel region, and a second gate structure overlying the at least one second channel region. First and second metal layers overlie the transistor. The first and second metal layers are configured to couple a common source line signal to the first and second source regions.
Information query
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