Invention Grant
- Patent Title: Reference electrode assemblies including thin, porous current collectors and methods of manufacturing thin, porous current collectors
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Application No.: US16577921Application Date: 2019-09-20
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Publication No.: US11245105B2Publication Date: 2022-02-08
- Inventor: Gayatri V. Dadheech , Brian J. Koch , Alfred Zhang , Robert S. Conell , Jing Gao
- Applicant: GM GLOBAL TECHNOLOGY OPERATIONS LLC
- Applicant Address: US MI Detroit
- Assignee: GM GLOBAL TECHNOLOGY OPERATIONS LLC
- Current Assignee: GM GLOBAL TECHNOLOGY OPERATIONS LLC
- Current Assignee Address: US MI Detroit
- Agency: Harness, Dickey & Pierce, P.L.C.
- Main IPC: H01M50/403
- IPC: H01M50/403 ; H01M10/48 ; C23C14/35 ; C23C14/34 ; C23C14/20 ; C23C14/14 ; G01R19/00 ; G01R31/364 ; H01M4/04 ; H01M4/52 ; H01M10/0525 ; H01M4/66 ; C23C14/00 ; H01M4/134 ; H01J37/34

Abstract:
A method of manufacturing a component for a reference electrode assembly according to various aspects of the present disclosure includes providing a separator having first and second opposing surfaces. The method further includes sputtering a first current collector layer to the first surface via magnetron or ion beam sputtering deposition. A porosity of the separator is substantially unchanged by the sputtering. In one aspect, the method further includes sputtering a second current collector layer to the second surface via magnetron or ion beam sputtering deposition. In one aspect, the first current collector layer includes nickel and defines a first thickness of greater than or equal to about 200 nm to less than or equal to about 300 nm and the second current collector layer includes gold and defines a second thickness of greater than or equal to about 25 nm to less than or equal to about 100 nm.
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