Invention Grant
- Patent Title: Nanomaterial ribbon patterning method and nanomaterial ribbon pattern manufactured thereby
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Application No.: US16954535Application Date: 2018-12-10
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Publication No.: US11247908B2Publication Date: 2022-02-15
- Inventor: Se Jeong Won , Hyun June Jung , Jae Hyun Kim , Kwang Seop Kim , Hak Joo Lee , Bong Kyun Jang
- Applicant: CENTER FOR ADVANCED META-MATERIALS
- Applicant Address: KR Daejeon
- Assignee: CENTER FOR ADVANCED META-MATERIALS
- Current Assignee: CENTER FOR ADVANCED META-MATERIALS
- Current Assignee Address: KR Daejeon
- Agency: Revolution IP, PLLC
- Priority: KR10-2017-0183691 20171229
- International Application: PCT/KR2018/015584 WO 20181210
- International Announcement: WO2019/132312 WO 20190704
- Main IPC: C01B32/194
- IPC: C01B32/194 ; G03F7/09 ; G03F7/20 ; G03F7/34 ; B82Y15/00 ; B82Y30/00 ; B82Y40/00

Abstract:
A nanomaterial ribbon patterning method includes: forming a first nanomaterial layer having a first threshold strain on an upper surface of a substrate; forming a second nanomaterial layer on an upper surface of the first nanomaterial layer; forming a thin layer having a second threshold strain smaller than the first threshold strain on an upper surface of the second nanomaterial layer; generating plural cracks on the thin layer and the second nanomaterial layer by applying tensile force to the substrate; placing a mask on an upper surface of the thin layer; removing the mask and peeling off the sacrificial layer on the upper surface of the thin layer; and removing the sacrificial layer to form a nanomaterial ribbon pattern.
Public/Granted literature
- US20200331760A1 NANOMATERIAL RIBBON PATTERNING METHOD AND NANOMATERIAL RIBBON PATTERN MANUFACTURED THEREBY Public/Granted day:2020-10-22
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