Invention Grant
- Patent Title: Photocurable resin, mixture, and photocurable resin composition
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Application No.: US16089323Application Date: 2017-03-29
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Publication No.: US11248079B2Publication Date: 2022-02-15
- Inventor: Tsubasa Ito , Takeaki Saiki , Kazunori Ishikawa
- Applicant: Sika Hamatite Co., Ltd.
- Applicant Address: JP Hiratsuka
- Assignee: Sika Hamatite Co., Ltd.
- Current Assignee: Sika Hamatite Co., Ltd.
- Current Assignee Address: JP Hiratsuka
- Agency: Thorpe North & Western
- Priority: JPJP2016-070984 20160331
- International Application: PCT/JP2017/012928 WO 20170329
- International Announcement: WO2017/170706 WO 20171005
- Main IPC: C08F2/46
- IPC: C08F2/46 ; C08F2/50 ; C08G61/04 ; C08F290/06 ; C08F2/48 ; C08G18/67 ; C08G18/69

Abstract:
A photocurable resin of the present technology contains: a main backbone chain having repeating units represented by Formulas (Ia) and (Ib), and a (meth)acryloyl group and a non-photoreactive group at terminals; the non-photoreactive group being at least one type selected from the group consisting of saturated hydrocarbon groups and aromatic hydrocarbon groups which optionally have a heteroatom; a hydroxy group, an amino group, —CH═NH, a carboxy group, or a mercapto group being not bonded to an end of the non-photoreactive group; a content of the repeating unit represented by Formula (Ia) being greater than 15 mol % of an amount of the main backbone chain; and contents of the (meth)acryloyl group and the non-photoreactive group each being 5 mol % or greater of an amount of the ends.
Public/Granted literature
- US20200299446A1 Photocurable Resin, Mixture, and Photocurable Resin Composition Public/Granted day:2020-09-24
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