- Patent Title: Thin film for optical element, method of manufacturing thin film for optical element, inorganic polarizing plate, method of manufacturing inorganic polarizing plate, optical element, and optical device
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Application No.: US16840726Application Date: 2020-04-06
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Publication No.: US11249233B2Publication Date: 2022-02-15
- Inventor: Toshiaki Sugawara , Akio Takada
- Applicant: Dexerials Corporation
- Applicant Address: JP Tokyo
- Assignee: Dexerials Corporation
- Current Assignee: Dexerials Corporation
- Current Assignee Address: JP Tokyo
- Agency: Osha Bergman Watanabe & Burton LLP
- Priority: JPJP2019-074790 20190410
- Main IPC: G02B5/30
- IPC: G02B5/30 ; G02B1/08 ; C23C14/34 ; C23C14/06 ; G02F1/03

Abstract:
Provided are a thin film for optical element as a single-layer thin film which contains a Si simple substance, a Si compound excluding Si alloy, and a metal or metal compound, a method of manufacturing the thin film for optical element, and an optical element including the thin film for optical element. Further provided are an inorganic polarizing plate including a reflection suppressing layer composed of the thin film for optical element, a method of manufacturing the inorganic polarizing plate, and an optical device including the inorganic polarizing plate.
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