Invention Grant
- Patent Title: Position detection apparatus, position detection method, lithography apparatus, and method of manufacturing article
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Application No.: US17036478Application Date: 2020-09-29
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Publication No.: US11249401B2Publication Date: 2022-02-15
- Inventor: Genki Murayama
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Priority: JPJP2019-183925 20191004
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L23/544 ; G03F9/00

Abstract:
A position detection apparatus configured to detect a pattern including a plurality of pattern elements formed on an object includes a control unit configured to detect the pattern by performing pattern matching between a template including a plurality of feature points and the plurality of pattern elements. While, performing pattern matching, the control unit changes positions of the plurality of feature points such that a correlation between an image and the template is within a predetermined allowable range.
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Information query
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