Power semiconductor device
Abstract:
In order to provide a power semiconductor device reducing a leakage current due to a defect layer and having a small fluctuation in a threshold voltage, included are an n-type epitaxial film layer formed on a surface of the single crystal n-type semiconductor substrate and having a concave portion and a convex portion; an insulating film formed on a first region in a top portion of the convex portion; a p-type thin film layer formed on a surface of the insulating film and a surface of the n-type epitaxial film layer to form a pn junction between the p-type thin film layer and the n-type epitaxial film layer; and an anode electrode, at least part of which is formed on a surface of the p-type thin film layer and part of which passes through the p-type thin film layer and the insulating film.
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