Invention Grant
- Patent Title: Ellipsometer and method for estimating thickness of film
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Application No.: US17002677Application Date: 2020-08-25
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Publication No.: US11255658B2Publication Date: 2022-02-22
- Inventor: Feng Yuan Hsu , Chi-Ming Yang , Ching-Hsiang Hsu , Chyi Shyuan Chern
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, P.C., Intellectual Property Attorneys
- Agent Anthony King
- Main IPC: G01B11/06
- IPC: G01B11/06 ; H01L21/66 ; G01N21/21

Abstract:
An ellipsometer includes a light source, a polarizer, an asymmetric wavelength retarder, an analyzer and an optical detection component. The light source is configured to provide a light beam having multiple wavelengths incident to a sample. The polarizer is disposed between the light source and the sample, and configured to polarize the light beam. The asymmetric wavelength retarder is configured to provide a varied retardation effect on the light beam varied by wavelength. The analyzer is configured to analyze a polarization state of the light beam reflected by the sample. The optical detection component is configured to detect the light beam from the analyzer.
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