Invention Grant
- Patent Title: Substrate with a multilayer reflective film, reflective mask blank, reflective mask, and semiconductor device manufacturing method
-
Application No.: US16829906Application Date: 2020-03-25
-
Publication No.: US11256167B2Publication Date: 2022-02-22
- Inventor: Masanori Nakagawa , Hirofumi Kozakai
- Applicant: HOYA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: HOYA CORPORATION
- Current Assignee: HOYA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Kilpatrick Townsend & Stockton LLP
- Priority: JPJP2019-061658 20190327,JPJP2020-042971 20200312
- Main IPC: G03F1/24
- IPC: G03F1/24

Abstract:
The substrate with a multilayer reflective film includes a substrate and the multilayer reflective film configured to reflect exposure light, the multilayer reflective film comprising a stack of alternating layers on a substrate, the alternating layers including a low refractive index layer and a high refractive index layer, in which the multilayer reflective film contains molybdenum (Mo) and at least one additive element selected from nitrogen (N), boron (B), carbon (C), zirconium (Zr), oxygen (O), hydrogen (H) and deuterium (D), and the crystallite size of the multilayer reflective film calculated from a diffraction peak of Mo (110) by X-ray diffraction is 2.5 nm or less.
Public/Granted literature
Information query