Invention Grant
- Patent Title: Dummy vertical structures for etching in 3D NAND memory and other circuits
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Application No.: US16782953Application Date: 2020-02-05
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Publication No.: US11257836B2Publication Date: 2022-02-22
- Inventor: Chih-Wei Hu , Teng-Hao Yeh , Yu-Wei Jiang
- Applicant: MACRONIX INTERNATIONAL CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes Beffel & Wolfeld LLP
- Agent Andrew Dunlap
- Main IPC: H01L27/11582
- IPC: H01L27/11582 ; H01L27/11565

Abstract:
A memory device comprises a stack of patterned conductor layers, at least a plurality of the layers comprising conductive strips including strips continuous with a pad and other strips isolated from the pad. An array of vertical pillars extends through the stack of patterned conductor layers, wherein memory cells are disposed at cross-points between the vertical pillars and patterned conductor layers. The array has an array boundary proximal to the pad. A first set of isolation blocks extends through the plurality of patterned conductor layers separating the strips continuous with the pad from the other strips isolated from the pad. A second set of isolation blocks inside the array boundary extends through the plurality of patterned conductor layers isolating the other strips from the pad.
Public/Granted literature
- US20210242228A1 DUMMY VERTICAL STRUCTURES FOR ETCHING IN 3D NAND MEMORY AND OTHER CIRCUITS Public/Granted day:2021-08-05
Information query
IPC分类: