Invention Grant
- Patent Title: Device and method for disturbance free 3D MRAM fabrication
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Application No.: US15898189Application Date: 2018-02-15
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Publication No.: US11257863B2Publication Date: 2022-02-22
- Inventor: Yibin Song , Zhuofan Chen
- Applicant: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION , SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION
- Applicant Address: CN Shanghai; CN Beijing
- Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION,SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION
- Current Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION,SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION
- Current Assignee Address: CN Shanghai; CN Beijing
- Agency: Anova Law Group, PLLC
- Priority: CN201710190486.3 20170328
- Main IPC: H01L27/22
- IPC: H01L27/22 ; H01L43/02 ; H01L43/08 ; H01L43/12

Abstract:
A magnetic random access memory includes a memory cell including a first fixed layer, a second fixed layer, and one or more free layers disposed between the first fixed layer and the second fixed layer. The first and second fixed layers are continuous layers and commonly shared by a plurality of memory cells. The magnetic random access memory has a relatively simple structure that not only reduces magnetic interference between memory cells, but also simplifies the fabrication process and increases the integration level.
Public/Granted literature
- US20180286917A1 DEVICE AND METHOD FOR DISTURBANCE FREE 3D MRAM FABRICATION Public/Granted day:2018-10-04
Information query
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