Invention Grant
- Patent Title: Semiconductor device
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Application No.: US16894888Application Date: 2020-06-08
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Publication No.: US11257943B2Publication Date: 2022-02-22
- Inventor: Motoyoshi Kubouchi , Soichi Yoshida
- Applicant: FUJI ELECTRIC CO., LTD.
- Applicant Address: JP Kanagawa
- Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee Address: JP Kanagawa
- Priority: JPJP2019-111786 20190617,JPJP2020-087471 20200519
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L27/07 ; H01L29/06

Abstract:
A semiconductor device includes a semiconductor substrate having a drift region, and an edge terminal structure portion provided between the active region and an end portion of the semiconductor substrate on an upper surface of the semiconductor substrate. The edge terminal structure portion includes a plurality of guard rings of a second conductivity type which are in contact with the upper surface, and a high concentration region of the first conductivity type which has a higher doping concentration than the drift region and is provided, between adjacent two of the guard rings, from a position shallower than lower ends of the guard rings to a position deeper than the lower ends of the guard rings. Each of the guard rings has a region that is not covered by the high concentration region as viewed from a lower surface side.
Information query
IPC分类: