Invention Grant
- Patent Title: Laser machining device and control method therefor
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Application No.: US17313636Application Date: 2021-05-06
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Publication No.: US11260470B2Publication Date: 2022-03-01
- Inventor: Takashi Shimanuki , Masanobu Koyata , Shuhei Oshida
- Applicant: Tokyo Seimitsu Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Tokyo Seimitsu Co., Ltd.
- Current Assignee: Tokyo Seimitsu Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JPJP2018-216749 20181119
- Main IPC: B23K26/03
- IPC: B23K26/03 ; B23K26/53 ; B23K26/08

Abstract:
A laser machining device which condenses a laser light inside a wafer and forms modified regions in a plurality of layers in the wafer, includes an infrared imaging optical system configured to face one surface of the wafer. In a case where a modified region positioned on a side of another surface opposite to the one surface of the wafer is defined as a first modified region and another modified region is defined as a second modified region, among the modified regions in the plurality of layers, the infrared imaging optical system has a focusing range that includes the first modified region and the another surface, and simultaneously images the first modified region and the another surface, and the second modified region is positioned outside the focusing range.
Public/Granted literature
- US20210276121A1 LASER MACHINING DEVICE AND CONTROL METHOD THEREFOR Public/Granted day:2021-09-09
Information query
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