Invention Grant
- Patent Title: Substrate processing apparatus and control method
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Application No.: US16245989Application Date: 2019-01-11
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Publication No.: US11260493B2Publication Date: 2022-03-01
- Inventor: Minoru Harada , Takahiro Nanjo , Hiroyuki Takenaka , Naoki Matsuda
- Applicant: EBARA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: EBARA CORPORATION
- Current Assignee: EBARA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: BakerHostetler
- Priority: JPJP2018-002272 20180111
- Main IPC: B24B21/00
- IPC: B24B21/00 ; B24B21/20 ; B24B49/16 ; B24B9/06 ; B24B49/00

Abstract:
A substrate processing apparatus which causes a processing tape to abut against a processing object, including: a tape supply reel configured to supply the processing tape; a tape recovery reel configured to recover the processing tape; a recovery motor configured to apply a torque to the tape recovery reel; a tape feed motor configured to feed the processing tape between the tape supply reel and the tape recovery reel; and a control unit configured to control the tape feed motor, wherein the control unit controls the torque of the recovery motor depending on a change in an outer diameter of a roll of the processing tape wound by the tape recovery reel such that tension applied to the processing tape is constant, using a feed length of the tape fed by the tape feed motor and a thickness of the processing tape.
Public/Granted literature
- US20190217438A1 SUBSTRATE PROCESSING APPARATUS AND CONTROL METHOD Public/Granted day:2019-07-18
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