- Patent Title: Resin, resist composition and method for producing resist pattern
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Application No.: US16465230Application Date: 2017-12-07
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Publication No.: US11261273B2Publication Date: 2022-03-01
- Inventor: Tatsuro Masuyama , Satoshi Yamaguchi , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Buchanan Ingersoll & Rooney PC
- Priority: JPJP2016-242645 20161214
- International Application: PCT/JP2017/044030 WO 20171207
- International Announcement: WO2018/110429 WO 20180621
- Main IPC: C08F220/28
- IPC: C08F220/28 ; C08F12/34 ; C08F220/30 ; C08F220/38 ; G03F7/004 ; G03F7/039 ; G03F7/20

Abstract:
Disclosed is a resin comprising a structural unit derived from a compound represented by formula (I′) and a structural unit having an acid-labile group: wherein R1 and R2 each independently represent an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom, Ar represents an aromatic hydrocarbon group which may have a substituent, L1 represents a group represented by formula (X1-1), etc., L11, L13, L15 and L17 each independently represent an alkanediyl group, L12, L14, L16 and L18 each independently represent —O—, —CO—, —CO—O—, —O—CO— or —O—CO—O—, and * and ** are bonds, and ** represents a bond to an iodine atom.
Public/Granted literature
- US20200010594A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Public/Granted day:2020-01-09
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