Invention Grant
- Patent Title: Method and an apparatus for producing a film of carbon nitride material
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Application No.: US16128564Application Date: 2018-09-12
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Publication No.: US11261518B2Publication Date: 2022-03-01
- Inventor: Ruiqin Zhang , Wei Xiong , Miaoyan Huang , Haoran Tian
- Applicant: City University of Hong Kong
- Applicant Address: HK Kowloon
- Assignee: City University of Hong Kong
- Current Assignee: City University of Hong Kong
- Current Assignee Address: HK Kowloon
- Agency: Renner Kenner Greive Bobak Taylor & Weber
- Main IPC: C23C14/22
- IPC: C23C14/22 ; C23C14/06 ; C03C17/22 ; H01L21/02

Abstract:
A method of producing a film of carbon nitride material, including the steps of providing a precursor of the carbon nitride material in a reacting vessel and a substrate substantially above the precursor of the carbon nitride material; heating the reacting vessel, the precursor of the carbon nitride material and the substrate at the first predetermined temperature; and quenching the reacting vessel to reach the second predetermined temperature; wherein the film of carbon nitride material is formed on a surface of the substrate during the quenching of the reacting vessel.
Public/Granted literature
- US20200080188A1 METHOD AND AN APPARATUS FOR PRODUCING A FILM OF CARBON NITRIDE MATERIAL Public/Granted day:2020-03-12
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