Invention Grant
- Patent Title: Pellicle for photomask and method of fabricating the same
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Application No.: US16940590Application Date: 2020-07-28
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Publication No.: US11262648B2Publication Date: 2022-03-01
- Inventor: Mun Ja Kim , Changyoung Jeong
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2018-0069205 20180615
- Main IPC: G03F1/62
- IPC: G03F1/62

Abstract:
A pellicle for a photomask comprises a pellicle membrane. The pellicle membrane incudes a base layer having a first surface and a second surface facing the first surface, and a first recovery layer covering the first surface of the base layer. A content of SP2 covalent bonds between carbon atoms contained in the first recovery layer is less than or equal to a content of SP2 covalent bonds between carbon atoms contained in the base layer.
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