- Patent Title: Sulfonium salt, polymer, resist composition, and patterning process
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Application No.: US16042179Application Date: 2018-07-23
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Publication No.: US11262653B2Publication Date: 2022-03-01
- Inventor: Masaki Ohashi , Jun Hatakeyama , Teppei Adachi
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JPJP2017-145057 20170727
- Main IPC: G03F7/039
- IPC: G03F7/039 ; C08L41/00 ; C07C381/12 ; C07C309/12 ; G03F7/004 ; C08F228/02 ; G03F7/11 ; G03F7/20 ; C08F20/38 ; C07D327/06 ; C08F12/14 ; C08F12/22
Abstract:
A polymer comprising recurring units derived from a sulfonium salt of specific structure having a polymerizable group is coated to form a resist film which is amenable to precise micropatterning because of improved LWR, CDU and resolution.
Public/Granted literature
- US20190033716A1 SULFONIUM SALT, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS Public/Granted day:2019-01-31
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