Invention Grant
- Patent Title: Film structure containing a photopolymer layer for holographic exposure and a coating layer of high resistance
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Application No.: US16611527Application Date: 2018-05-08
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Publication No.: US11267943B2Publication Date: 2022-03-08
- Inventor: Serguei Kostromine , Benjamin Herzberg , Thomas Rölle , Dennis Hönel , Thomas Fäcke , Heinz-Guenter Auweiler
- Applicant: Covestro Deutschland AG
- Applicant Address: DE Leverkusen
- Assignee: Covestro Deutschland AG
- Current Assignee: Covestro Deutschland AG
- Current Assignee Address: DE Leverkusen
- Agency: Faegre Drinker Biddle & Reath LLP
- Priority: EP17170294 20170509
- International Application: PCT/EP2018/061828 WO 20180508
- International Announcement: WO2018/206556 WO 20181115
- Main IPC: G03H1/02
- IPC: G03H1/02 ; G03H1/00 ; G11B7/253 ; G11B7/254 ; C08F2/50 ; C08J7/04 ; C08K5/5398 ; C08L29/14
Abstract:
The invention relates to a layer construction comprising a curable protective layer C and a photopolymer layer B, to a method for producing such a layer construction, to a method for producing a hologram using such a layer construction, to a sealed holographic medium and to the use of such a layer construction for producing a hologram.
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